Materials & Samples
We can work on samples from just a few mm in size up to full 6” semiconductor wafers. Many materials can be patterned including metals, glass, silicon, compound semiconductors, polymers, insulators and metal oxides.
In addition to pattern design and e-beam lithography we can offer a comprehensive range of supporting processes and fabrication facilities. They include:
- Sample preparation & spin coating Ion beam milling
- Reactive Ion etching (RIE)
- Inductively Coupled Plasma (ICP)
- Etching Plasma enhanced chemical vapour deposition of SiO2 and SiN
- Sputter deposition
Using the facilities
If you are interested in accessing our facilities please contact us to discuss your requirements. We are very happy to offer advice on the design and fabrication of your nanostructures. If we can fulfil your requirements within the capabilities of our facilities we will provide a full written quote and project schedule.
Costs and Timescales
Our projects vary hugely in cost and complexity. The basic rate for use of the electron beam lithography tool is £50 per hour (excl. VAT). Additional supporting fabrication is priced separately according to the tool, material and labour requirements of the project. Further details are available on request.
We endeavour to complete all projects as quickly as possible. Timescales though vary according to the demands of the project and the amount of development and process optimisation required. We always discuss scheduling issues with customers in advance and aim to provide regular progress updates during the project. We also guarantee to start work on a project within 2 weeks of receiving an order (provided equipment is operational at the time).