The Sheffield Electron Beam Lithography facility gives you access to a high quality Raith-150 electron beam lithography tool. This machine is capable of patterning 20nm features on a wide range of substrates of up to 150 x 150mm in size.
The tool is housed in a purpose built climate controlled laboratory at the University of Sheffield’s state of the art Kroto Research Institute and Centre for Nanoscience and Technology (CNT). The CNT has over 750m2 of cleanroom space in total and is home to the EPSRC National for III-V Technologies. We therefore have direct access to a huge range of facilities and expertise for epitaxy, fabrication and characterisation of III-V semiconductor materials and devices. In addition to semiconductors we also have considerable experience of creating nanostructures in functional magnetic materials and molecular materials.
For further information on the technical aspects of e-beam lithography please download our information sheet.